BADALI, Y. Et Al. 2018. Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures. Journal of Electronic Materials , vol.47, no.7 , 3510-3520.

BADALI, Y., Nikravan, A., ALTINDAL, Ş., & Uslu, İ., (2018). Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures. Journal of Electronic Materials , vol.47, no.7, 3510-3520.

BADALI, YOSEF Et Al. "Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures," Journal of Electronic Materials , vol.47, no.7, 3510-3520, 2018

BADALI, YOSEF Et Al. "Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures." Journal of Electronic Materials , vol.47, no.7, pp.3510-3520, 2018

BADALI, Y. Et Al. (2018) . "Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures." Journal of Electronic Materials , vol.47, no.7, pp.3510-3520.

@article{article, author={YOSEF BADALI Et Al. }, title={Effects of a Thin Ru-Doped PVP Interface Layer on Electrical Behavior of Ag/n-Si Structures}, journal={Journal of Electronic Materials}, year=2018, pages={3510-3520} }